| Reticle inspection system with motorized Leica high performance stereo microscope |  | MCS-RI Mask inspection- system. For customized semi and fully automated inspection and measurement tasks a standardized, modular software solution is now available:The microscope control software (mcs)
Price on demand ProMicron 24 Bachmühlweg 74366 Kirchheim /Neckar
Telephone: +49 7143 - 40560
Fax: +49 7143 - 405615
Email: info@promicron.com
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The permanetly increasing integration density in the photolithographie affords exactly produced and controlled reticles.
In order to inspect these masks quick and reliably a system was developed, which combines a fast and user-friendly classification with an intuitive software surface and extraordinary optical features to recognize reticle defects.
The system comprises up-to-date LED illumination, a premium Leica stereo microscope and inspection software - freely adaptable to your requirements. |
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Range of application
Inspection and repairing of masks with and without pellicle in incident and transmitted light. |
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The measuring system:
- programm controlled illumination settings (for incident and transmitted light, brightfield, darkfield and grazing light) 5 different illumination types where single and multiple combniations of which can be automatically controlled by the software.
- progamm controlled inspection precedure motor driven xy stage
- modular assembly and individual configuration
- mask control
- motorised high performance microscope MZ 16 oder MZ 205 optimum ergonomics |
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For each inspection job there are special illumination types available, which are automatically controlled by the software. Thus i.e. for a particle inspection, the incident darkfield illumination is activated, so that only the particles on the mask are flashing up and the operator is easily able to classify them. During this procedure the mask-structures remain dark and do not disturb the scanning process. Thereby the mask with an magnification-related field of view is scanned; the operator just has to mark and classify the defects of the reticle. |
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The illumination type and position of the particels which have been detected in the in the first step were restored, so that - after the cleaning process - a repositioning and review and if necessary a further cleaning process is easily possible.
mcs is multifunctional
and thus suitable for several tasks
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manual inspection and review
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CD-measurement, structure measurement,
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automatic surface inspection
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contact-free layer thickness measurement
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pattern recognition for automatic measurement and inspection
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macro inspection with image and results database
...a system
...easy to integrate
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in process structures
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various import and export possibilities for measuring processes
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mapping and image processing data
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reporting with statistics, graphs and export of results in several formats (ASCII, XML, Excel, HTML...)
mcs connects...
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automated microscopes with high performance measuring processes and contrast methods
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application specified camera systems
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interferometric and confocal sensors
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motorized xy stages
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wafer loader / sorter
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wafer ID reader for fully automated processes
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ink systems for physical and virtual inking
and offers
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comprehensive user support such as a comfortable assistant function in order to teach-in measuring and inspection programs quickly and easily
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interactive map-view with position display or direct positioning of the xy stage
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exact navigation via mouse click in the live image
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comprehensive documentation with image and results data archive for
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time-delayed off-line analysis. |
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